hk metal gate
2022年11月8日—由于传统微缩(scaling)技术系统的限制,DRAM的性能被要求不断提高,而HKMG(High-k/MetalGate)则成为突破这一困局的解决方案。SK海力士通过采用该新 ...,,Intelmadeasignificantbreakthroughinthe45nmprocessbyusingahigh-k(Hi-k)materialcalledhafniu...
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書名:High-k/Metal-gateDevicesforFutureCMOSTechnology,語言:英文,ISBN:9783836465298,頁數:180,作者:Abermann,Stephan,出版日期:2008/11/06, ...
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